

Semiconductor

Stud Bump | 長さ、高さ、体積、粗さ、角度 |
CMP | Warpage、 粗さ |
CVD | 粗さ |
Wafer | Warpage、スクラッチ、粗さ |
PCB

Substrate (Pad, Trace, Space, Anchor, Land, Ball Pad, Via Hole, Dimple, SR) | 高さ、幅、深さ、長さ、厚み、体積、粗さ、真円度 |
BGA | Ball高さ、長さ、Coplanarity |
Display

Photo Space | 長さ、高さ、幅、体積 |
RGB | 厚み、粗さ、BM 厚み |
TFT Pattern | 高さ、幅、粗さ |
BLU | 角度、幅、高さ、粗さ |
Metal Jet | 幅、高さ、角度、粗さ |
Glass | Defect形態、幅、高さ |
OLED | 蒸着高さ、角度、体積 |
その他

MEMS | 高さ、幅 |
Precision machine part | 粗さ、高さ、幅 |
Laser Marking | 深さ、体積 |
Inkjet | 体積、高さ、面積 |
Micro Lens | 曲率、高さ |
RFID | 高さ、幅、粗さ |
Specification
Vertical Resolution | VSI,VEI < 0.5nm, VPI < 0.1nm |
Lateral Resolution | 0.05~7.2um(Depends on magnification) |
Height Repeatability | ≤0.3% @ 1σ |
Objective Lens | 1 Selectable(Manual) |
Zoom Lens | 1 Selectable(1.0x @ Manual) |
Camera Format | 1/2″ Mono Camera |
Scan Method | Piezo Actuator @ SGS Closed loop |
PZT Scan Range | ≤100um |
Scan Speed | 7.5um/sec(1x) / 22.5um/sec(3x) |
Illumination | White LED |
Filter | Visible/Bandpass Filter(Manual) |
X/Y Axis Stroke | 25mm(X) x 13mm(Y) |
Z Aixs Stroke | 13mm |
Tilt Aixs Stroke | ± 2° |
Work Table Size | 80mm X 80mm |
Max Workpiece Load | ≤ 1kg |
Layout Size | 1100mm(W) x 700mm(D) x 1450mm(H) |
Software | Surface View/Surface MAP@ Window10 (64bit) |
Stitching | NO |
Vibration Isolation Platform | Passive Type(Vertical Resonance: 2.5Hz) |
Input Power | 2∮,110V/220V(±10%), 50/60Hz |
Option
Interference Lens | 2.5x, 5.0x, 10x, 20x, 50x, 100x |
Objective Lens | 2.5x, 5.0x, 10x, 20x, 50x, 100x |
Zoom Lens | 0.55x, 0.75x, 1.0x, 1.5x, 2.0x |
PZT Scan Range | ≤250um |
Camera Format | 2/3″ or 1″ Mono Camera |
Work Table | Vacuum Table, Rotation Table |